Effective lapping and polishing for ultra-hard substrates such as silicon carbide and ceramics
Reduced total thickness variation (TTV), improved removal rate and better surface finish compared to the copper platen process when used with 3M™ Trizact™ Composite Slurry, a good option for the rough lapping step
Alternative to copper platen process with no need to re-groove copper platen and no copper in polishing waste
Copyright © 2024 by Shenzhen Weshare New Material Co., Ltd - Privacy policy
3M™ Trizact™ Polishing Pad HT-250: Revolutionizing Precision in Ultra-Hard Material Finishing
Key Advantages:
Product Overview:
The 3M™ Trizact™ Polishing Pad HT-250 is a cutting-edge microreplicated silicon wafer lapping pad designed for finishing ultra-hard materials such as sapphire, silicon carbide, and ceramics with unparalleled precision and efficiency.
Application and Compatibility:
Typical properties
Details
Application
Finishing, Lapping, Polishing, Scratch Removal
Product Usage
Semiconductor Wafers, Ultra-hard Substrates
Substrate
Gallium Arsenide, Gallium Nitride, Lithium Tantalate, Sapphire, Silicon Aluminum, Silicon Carbide, Silicon Nitride