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3M

3M™ Trizact™ Polishing Pad HT-250

Effective lapping and polishing for ultra-hard substrates such as silicon carbide and ceramics

Reduced total thickness variation (TTV), improved removal rate and better surface finish compared to the copper platen process when used with 3M™ Trizact™ Composite Slurry, a good option for the rough lapping step

Alternative to copper platen process with no need to re-groove copper platen and no copper in polishing waste

Description

3M™ Trizact™ Polishing Pad HT-250: Revolutionizing Precision in Ultra-Hard Material Finishing 

Key Advantages:

  • Ultra-Hard Material Mastery:‌ Exceptional lapping and polishing performance on challenging substrates like silicon carbide and ceramics.
  • Superior Outcomes:‌ Achieve lower total thickness variation (TTV), faster removal rates, and superior surface finishes compared to traditional copper platen processes, especially when paired with 3M™ Trizact™ Composite Slurry.
  • Sustainable Innovation:‌ An eco-friendly alternative to the copper platen process, eliminating the need for copper regrooving and copper in polishing waste.
  • Durable and Efficient:‌ Benefit from a long pad life, ensuring consistent performance and cost-effectiveness.
  • Precision Engineering:‌ Delivers good TTV, high removal rates, and an excellent surface finish, making it ideal for the rough lapping step.
  • User-Centric Design:‌ Features easy pad replacement and the versatility to be directly mounted onto various lapping plates, including flat/smooth and waffle patterns.

 

Product Overview:
The 3M™ Trizact™ Polishing Pad HT-250 is a cutting-edge microreplicated silicon wafer lapping pad designed for finishing ultra-hard materials such as sapphire, silicon carbide, and ceramics with unparalleled precision and efficiency.

Application and Compatibility:

  • Rough Lapping Excellence:‌ Perfect for use in the rough lapping process step, enhancing the initial stage of material finishing.
  • Optimized Performance:‌ When used in conjunction with 3M™ Trizact™ Composite Slurries, it provides optimized performance, ensuring superior results.
  • Versatile Adhesion:‌ Can be easily adhered to single- or double-sided lapping platens, offering flexibility and compatibility with existing equipment.

  

Typical properties

Details

Application

Finishing, Lapping, Polishing, Scratch Removal

Product Usage

Semiconductor Wafers, Ultra-hard Substrates

Substrate

Gallium Arsenide, Gallium Nitride, Lithium Tantalate, Sapphire, Silicon Aluminum, Silicon Carbide, Silicon Nitride

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